Description
Product Description
Product Name:MKS RPS AX7695 Remote Plasma Source
Series:RPS Series
Function:Generate high-density and uniform plasma for various applications such as material modification,surface treatment,and thin film deposition.
Usage:
Semiconductor manufacturing:wafer cleaning,etching,deposition,etc
Photovoltaic manufacturing:glass cleaning,coating,etc
Display manufacturing:etching,deposition,etc
Other:biomedical,aerospace,automotive manufacturing,etc
Features:
High density,uniform plasma
Controllable plasma parameters
Stable operation
Easy to maintain
Product Description:
MKS RPS AX7695 Remote Plasma Source is a high-performance and highly reliable remote plasma source manufactured using advanced radio frequency(RF)technology and microwave technology.It has the characteristics of high density,uniform plasma,controllable plasma parameters,stable operation,and easy maintenance,and can be widely used in various fields such as semiconductor manufacturing,photovoltaic manufacturing,and display manufacturing.
Product Description:
The MKS RPS AX7695 remote plasma source consists of a power supply,matching network,plasma cavity,etc.The power supply generates high-frequency or microwave energy,which is transmitted to the plasma cavity through a matching network.In the plasma cavity,the electromagnetic field excites the gas into plasma.Plasma is directed towards the target surface through the plasma outlet for material modification,surface treatment,thin film deposition,and other operations.
Product parameters:
Model:RPS AX7695
Frequency:13.56 MHz
Power:2 kW
Plasma density:>10^12 cm^-3
Plasma uniformity:<5%
Product specifications:
Dimensions:600 mm x 400 mm x 300 mm
Weight:20 kg
Application field:
The MKS RPS AX7695 remote plasma source is widely used in the following fields:
Semiconductor manufacturing:wafer cleaning,etching,deposition,etc
Photovoltaic manufacturing:glass cleaning,coating,etc
Display manufacturing:etching,deposition,etc
Other:biomedical,aerospace,automotive manufacturing,etc