RPS AX7695 MKS Remote Plasma Source

   Model:RPS AX7695

       Brand:MKS
  Manufacturer:MKS
  Series:Control Power Supply
Category:
Contact Us WhatsApp / Wechat:+8618150087953 / +86 18005022138
Phone:+86 18150087953 / +86 18005022138
Email:sales@cxplcmro.com

Description

  Product Description
  Product Name:MKS RPS AX7695 Remote Plasma Source
  Series:RPS Series
  Function:Generate high-density and uniform plasma for various applications such as material modification,surface treatment,and thin film deposition.
RPS AX7695 MKS Remote Plasma Source

RPS AX7695 MKS Remote Plasma Source

RPS AX7695 MKS Remote Plasma Source

RPS AX7695 MKS Remote Plasma Source

  Usage:
  Semiconductor manufacturing:wafer cleaning,etching,deposition,etc
  Photovoltaic manufacturing:glass cleaning,coating,etc
  Display manufacturing:etching,deposition,etc
  Other:biomedical,aerospace,automotive manufacturing,etc
  Features:
  High density,uniform plasma
  Controllable plasma parameters
  Stable operation
  Easy to maintain
  Product Description:
  MKS RPS AX7695 Remote Plasma Source is a high-performance and highly reliable remote plasma source manufactured using advanced radio frequency(RF)technology and microwave technology.It has the characteristics of high density,uniform plasma,controllable plasma parameters,stable operation,and easy maintenance,and can be widely used in various fields such as semiconductor manufacturing,photovoltaic manufacturing,and display manufacturing.
  Product Description:
  The MKS RPS AX7695 remote plasma source consists of a power supply,matching network,plasma cavity,etc.The power supply generates high-frequency or microwave energy,which is transmitted to the plasma cavity through a matching network.In the plasma cavity,the electromagnetic field excites the gas into plasma.Plasma is directed towards the target surface through the plasma outlet for material modification,surface treatment,thin film deposition,and other operations.
  Product parameters:
  Model:RPS AX7695
  Frequency:13.56 MHz
  Power:2 kW
  Plasma density:>10^12 cm^-3
  Plasma uniformity:<5%
  Product specifications:
  Dimensions:600 mm x 400 mm x 300 mm
  Weight:20 kg
  Application field:
  The MKS RPS AX7695 remote plasma source is widely used in the following fields:
  Semiconductor manufacturing:wafer cleaning,etching,deposition,etc
  Photovoltaic manufacturing:glass cleaning,coating,etc
  Display manufacturing:etching,deposition,etc
  Other:biomedical,aerospace,automotive manufacturing,etc
Contact Us WhatsApp / Wechat:+86 18150087953 / +86 18005022138
Phone:+86 18150087953 / +86 18005022138
Email:sales@cxplcmro.com