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Description
Product Description
The GHW-12Z ENI RF plasma generator generates RF plasma.
Features:
Featuring self addressing,self positioning,and automatic I/O detection.
GHW-12Z ENI RF Plasma Generator is a high-performance and highly reliable RF power supply designed specifically for generating RF plasma.
The GHW-12Z ENI RF plasma generator adopts advanced RF technology and control circuits,which have the characteristics of fast response,high precision,and high stability.At the same time,it also has self-protection and fault diagnosis functions to ensure the long-term stable operation of the equipment.
The GHW50 13.56 MHz,5 kW RF plasma generator provides on-site validated reliability,excellent stability,and unparalleled repeatability,achieving high uptime and process yield.The GHW series RF plasma generator can provide voltages of 208 VAC and 400/480 VAC.The GHW RF plasma generator is highly suitable for plasma enhanced chemical vapor deposition(PECVD),high-density plasma CVD(HDPCVD),etching,and other thin film applications in the manufacturing process of integrated circuits,flat panel displays,and data storage devices.
application area
The GHW-12Z ENI radio frequency plasma generator is widely used in the semiconductor industry,materials science,biomedical and other fields,such as plasma etching,thin film preparation,surface treatment,etc.
